Photoresist Developers
- Developer HC (RD-41)
Fast clean precise, free rinsing. 40% or 560 grams/liter active. - UltraDeveloper (RDX-1076)
Developer-Cleaner, eliminates cleaning of spray chamber. Ideal for pH controllers, keeps electrodes clean. Especially important for Soldermask Developers. - Sodium Carbonate Photoresist Developer (RD-39)
The dry low cost alternative. - Developer Defoamer (RD-43)
Free rinsing, cost-effective.