Defoamers
- Defoamer A (RD-28) For full aqueous resist strippers. Cost-effective and free rinsing
- Developer Defoamer (RD-43) For Carbonate based developers. Non-sludging, non-clogging, free rinsing.
- In-Process Defoamer (RD-36) General purpose, water soluble. Can be used for any process application.
- Silicone Defoamer (RD-71) Concentrated, cost effective, for waste water applications only.
Other Process Chemicals
- HAL Flux (RD-88) A cost-effective high performance flux, complete coverage, cold water rinseable.
- ChemStrip 99 (RD-37) Accelerator, fume suppressant, for Nitric Acid rack strippers.
- Equipment Cleaner (RD-34) For complete cleaning of metal and resist residues from developers, strippers, etc..
- MaskStrip (RD-85) A “safe solvent” for total cleaning of screens
- TerClean (RD-01) A general purpose orange Terpene based cleaner.
- Developer EC-1 (RDZ-1607) For Full Aqueous Dry Film Photoresists.
- Developer EC-2 (RDZ-1608) For Full Aqueous Dry Film Photoresists.
- Developer EC-3 (RDZ-1609) Sodium Carbonate Monohydrate.
- Defoamer EC-D (RDZ-1610) Free Rinsing for Photoresist Developers.
- Defoamer EC-S (RDZ-1611) To Defoam ResiStrip™ EC-1.
- Defoamer EC-S2 (RDZ-1612) Free Rinsing for use in Photoresist Strippers or other Spray Systems.